• Exhibition:
  • Booth No: 47-14

Maskless Exposure Machine

Maskless Exposure Machine
Maskless Exposure Machine


  1. World's First
  2. Feature Direct imaging machine
  3. Maskless exposure system with fast patterning by point-array system. Resolution spec:L/S:1um No photomask is needed in the lithography process,which mnimizes development cost and time lag to the market.

  4. Product Categories:
    Film Related
    • Highly-functional Film
    • Functional Material
    • Related Technology
    Metal Related
    • Metal Material/Alloy
    • Metal Product
    Ceramics Related
    • Ceramics/Raw Material
    • Ceramics Product/Processing
    • Related Technology
    LCD/OLED Related
    • Material/Component
    • Manufacturing Equipment/Inspection
    • Display/Sensor Device
    • Related Technology
    Laser/Photonics Related
    • Optical Component/Material

Other Products/Services:

  • Exposure system for films

*Contact information is open to public for the purpose of visitors to request appointments before the show.
Unauthorised sales activities a/o inappropriate activities toward exhibitors are strictly prohibited.

Visitor Ticket Request (FREE)

10th Highly-functional Material Week TOKYO 29th FINTECH JAPAN 19th Photonix 2019

For Visiting Enquiries

Contact us by e-mail +81-3-3349-8568

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